Chance of

Application

(COA)

Stage of

Development

(SOD)

Field of

Application

(FOA)

E = excellent

VG = very good

G = good

P = potential

PoC = proof-of-concept demonstration

S = short term development needed (~1yr)

M = medium term development needed (1-3yrs)

L = long term development needed (>3yrs)

A = all applications

MF = multiple field of application

(e.g.  microelectronics, and optoelectronics)

Field

Application

COA

SOD

FOA

Microelectronics

Protective coatings

First oxide layer

Bottom antireflection coating for deep submicron photolithography

Gate oxide

Field oxide

Diffusion barrier layer

Sidewall spacers/shallow trench insulation

Copper wires passivation

Intralevel dielectrics

Non linear optical coating

E

E

E

VG

VG

VG

VG

E

VG

G

PoC

S

PoC

M

M

M

M

M

L

L

A

A

MF

MF

MF

MF

MF

MF

Discrete electronics

Device insulation

E

M

Thin Film Transistors (TFT) for Flat Panel Displays (FPD)

Gate oxide

Field oxide

Sidewall spacers

E

VG

VG

PoC

M

M

MF

MF

MF

Optoelectronics

Porous silicon passivation

Coating for sensors, detectors, semiconductor lasers, etc.

VG

VG

PoC

L

MF

MF

Solar Cells

Antireflection coatings for Si solar cells

Antireflection coatings for GaAs, CIS, CdTe solar cells

Transparent conductive coating for thin film solar cells

E

G

G

PoC

M

L

MF

MF

MF

Other Applications

GaAs technology (most applications in microelectronics, and optoelectronics)

Extension of RTWCG process to other than SiO-based coatings for various substrates and applications

Metal coatings for special applications, i.e., tribology & harsh environments

G

VG

G

L

M-L

L

MF

MF