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SPECIAL MATERIALS RESEARCH AND TECHNOLOGY

THE COMPANY:

Special Materials Research and Technology (SPECMAT), Inc., is a small technology research company incorporated in 1995 in the State of Ohio as a "for-profit" corporation. SPECMAT is developing novel thin film dielectrics, thin film metal coating technologies, and advanced metallic alloy coating technologies for a variety of electronic (ULSI / VLSI), optoelectronic/photonic (photovoltaic cells), and special metal coating applications.

SPECMAT offers engineering and support services in the above and other materials science areas. To date SPECMAT has received R&D contracts from governmental sources (e.g. NASA, DARPA, and BMDO Phase I, and II SBIR awards) as well as from private companies (e.g. Tecstar).

THE MANAGEMENT:

Maria Faur, Ph.D, CEO, and Owner. Dr. Maria Faur was involved in Material Science and Solid State Chemistry R&D with a number of research institutions in the US (NASA, US National Research Council, and Cleveland State University) as well as Europe. She has published 112 scientific papers and holds 16 patents, mostly in surface science areas.

Mircea Faur, Ph.D, is the R&D VP. Dr. Micea Faur has published over 120 scientific papers and holds 25 patents, mostly in semiconductor devices, solid state physics, energy conversion, and materials science. He also taught various Physics, and Electrical Engineering courses.

THE FOCUS:

SPECMAT is in the process of researching revolutionary room temperature wet chemical growth processes for growing oxides used in:

• microelectronics (e.g. ULSI / VLSI);

• photonics / optoelectronics (e.g. photovoltaic cells);

• and metal coatings.

The Room Temperature Wet Chemical Growth (RTWCG) is a simple and inexpensive room temperature process, that coats substrates with desired oxides (such as silicon oxide) by simply soaking the substrate into the RTWCG solution. This unique RTWCG medium utilizes a mixture of inexpensive liquid Si, C, F, and N precursors. Homogeneous catalysts are added to increase the growth rate. The pH is adjusted by adding non-invasive alkaline solutions. Click on the following link for a more in-depth explanation of the Room Temperature Wet Chemical Growth of Silicon Oxide Thin Films Chemistry.

The Metal Coating Process (MeC) is a novel process capable of depositing essentially any thin film metal coating onto any metallic substrate. This metal coatings process has demonstrated ultra-low cost and simplicity when compared to traditional technologies. The films are very uniform, and can be applied on any oddly shaped metallic object.

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